TY - JOUR
T1 - Ultrasmall and Ultrathin Ni-Based Resistance Temperature Detector Integrated in Micro Thermoelectric Devices for in Situ Temperature Measurement
AU - Huang, Yue
AU - Zhu, Wei
AU - Zhou, Jie
AU - Yu, Yuedong
AU - Zhang, Qingqing
AU - Hu, Shaoxiong
AU - Deng, Yuan
N1 - Publisher Copyright:
© 2001-2012 IEEE.
PY - 2023/9/1
Y1 - 2023/9/1
N2 - With the ever-increasing demand of miniature chip cooling and self-powered technology, more attention has arisen on micro thermoelectric (TE) devices. Nevertheless, accurate temperature and performance evaluations for micro TE devices are still challenging due to their high element density and small size. Herein, an in situ integration method using ultrasmall and ultrathin resistance temperature detectors (RTDs) is developed to precisely characterize temperatures across thin TE legs under actual testing scenarios. With theoretical analysis based on a 1-D thermal resistance model, the ratio of effective temperature difference across the TE leg increases to 33.97% comparing with 11.04% using commercial thermocouples. Then, the fabrication of the RTD is shown, and a temperature coefficient of resistance of 0.336% C-1 with high linearity, a response time of 43 ms, a resolution of 0.1 °C, and good compatibility is exhibited. By integrating the detector on a leg of a TE device, the in situ temperature of a micro TE device is measured, indicating an increase of 201.2% of the output TE voltage, after temperature correction, as well as an exponential enhancement of power density. This in situ temperature measurement method can be extended to further guide performance evaluations for various microsystems.
AB - With the ever-increasing demand of miniature chip cooling and self-powered technology, more attention has arisen on micro thermoelectric (TE) devices. Nevertheless, accurate temperature and performance evaluations for micro TE devices are still challenging due to their high element density and small size. Herein, an in situ integration method using ultrasmall and ultrathin resistance temperature detectors (RTDs) is developed to precisely characterize temperatures across thin TE legs under actual testing scenarios. With theoretical analysis based on a 1-D thermal resistance model, the ratio of effective temperature difference across the TE leg increases to 33.97% comparing with 11.04% using commercial thermocouples. Then, the fabrication of the RTD is shown, and a temperature coefficient of resistance of 0.336% C-1 with high linearity, a response time of 43 ms, a resolution of 0.1 °C, and good compatibility is exhibited. By integrating the detector on a leg of a TE device, the in situ temperature of a micro TE device is measured, indicating an increase of 201.2% of the output TE voltage, after temperature correction, as well as an exponential enhancement of power density. This in situ temperature measurement method can be extended to further guide performance evaluations for various microsystems.
KW - In situ measurement
KW - micro thermoelectric (TE) device
KW - nickel thin film
KW - resistance temperature detector (RTD)
KW - thermal resistance
UR - https://www.scopus.com/pages/publications/85165303635
U2 - 10.1109/JSEN.2023.3294524
DO - 10.1109/JSEN.2023.3294524
M3 - 文章
AN - SCOPUS:85165303635
SN - 1530-437X
VL - 23
SP - 19409
EP - 19416
JO - IEEE Sensors Journal
JF - IEEE Sensors Journal
IS - 17
ER -