@article{602eb70ed87946bb9e8ef840af7743b5,
title = "Two-photon polymerization lithography for imaging optics",
abstract = "Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.",
keywords = "3D printing, additive manufacturing, imaging, optics and nanophotonics, two-photon polymerization lithography",
author = "Hao Wang and Pan, \{Cheng Feng\} and Chi Li and Menghrajani, \{Kishan S.\} and Schmidt, \{Markus A.\} and Aoling Li and Fu Fan and Yu Zhou and Wang Zhang and Hongtao Wang and Nair, \{Parvathi Nair Suseela\} and Chan, \{John You En\} and Tomohiro Mori and Yueqiang Hu and Guangwei Hu and Maier, \{Stefan A.\} and Haoran Ren and Huigao Duan and Yang, \{Joel K.W.\}",
note = "Publisher Copyright: {\textcopyright} 2024 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT.",
year = "2024",
month = aug,
doi = "10.1088/2631-7990/ad35fe",
language = "英语",
volume = "6",
journal = "International Journal of Extreme Manufacturing",
issn = "2631-8644",
publisher = "IOP Publishing Ltd.",
number = "4",
}