摘要
The thermal radiation characteristics of a SiC substrate thin-film with negative refractive index(NIM) is studied in this paper. Based on the transmit matrix method and Kirchhoff radiation law, the formula of the thermal radiation characteristics of NIM with SiC substrate is derived. By comparation, the influence of the NIM film on the thermal radiation characteristics of the SiC substrate is investigated. Results show that the thermal radiation characteristics of traditional semiconductor materials can be changed by a NIM thin-film. And the directional characteristics and spectral property can be modulated, by adjusting the system parameters of the thin-film structure.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 2117-2120 |
| 页数 | 4 |
| 期刊 | Kung Cheng Je Wu Li Hsueh Pao/Journal of Engineering Thermophysics |
| 卷 | 31 |
| 期 | 12 |
| 出版状态 | 已出版 - 12月 2010 |
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