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Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via

  • Wen Shi
  • , Yijiao Wang*
  • , Jiayao Wu
  • , Tao Zou
  • , Ruotong Liu
  • , Hui Zhang*
  • , Fei Liu
  • , Weisheng Zhao
  • *此作品的通讯作者
  • Beihang University
  • Anhui Province Key Laboratory of Spintronic Chip Research and Manufacturing
  • Peking University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

2.5D chiplet-based systems, integrating heterogeneous chiplets manufactured at disparate technology nodes, have emerged as a promising solution for balancing cost and performance. However, thermal management remains a critical challenge. This study systematically investigates thermal-aware design optimization for chiplet-based systems through placement strategy analysis and thermal through silicon via (TTSV) parameters optimization. Six distinct chiplet placements are evaluated for a nine-chiplets system using finite element method (FEM) thermal simulations. Subsequent TTSV parametric analysis reveals an inverse correlation between via density and peak operating temperature, showing up to 15.5% thermal reduction in high-power scenarios. Simulation data identify feasible TTSV configurations (via-to-area ratio vs. peak temperature) within safe operating limits. This work provides empirical guidance for early-stage thermal design, emphasizing the interplay between chiplet and vertical interconnect density to ensure both performance and reliability in advanced packaging architectures.

源语言英语
主期刊名2025 International Symposium of Electronics Design Automation, ISEDA 2025
出版商Institute of Electrical and Electronics Engineers Inc.
584-589
页数6
ISBN(电子版)9798331536961
DOI
出版状态已出版 - 2025
活动2025 International Symposium of Electronics Design Automation, ISEDA 2025 - Hong Kong, 中国
期限: 9 5月 202512 5月 2025

出版系列

姓名2025 International Symposium of Electronics Design Automation, ISEDA 2025

会议

会议2025 International Symposium of Electronics Design Automation, ISEDA 2025
国家/地区中国
Hong Kong
时期9/05/2512/05/25

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