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Theoretical study about the formation of the stacking faults in GaN nanowires along different growth directions

  • Xiaojing Gong*
  • , Jingping Zhang
  • , Ke Xu
  • , Zhigao Wang
  • , Hui Yang
  • , Rong Yu
  • , Wei Zhan
  • *此作品的通讯作者
  • CAS - Suzhou Institute of Nano-Tech and Nano-Bionics
  • Suzhou Nanowin Science and Technology Co., Ltd
  • University of Chinese Academy of Sciences
  • Tsinghua University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Semiconducting nanowires offer the possibility of nearly unlimited complex bottom-up design, which allows for new device concepts. However, essential parameters that determine the electronic quality of the wires, and which have not been controlled yet for the III-V compound semiconductors, are the wire crystal structure and the stacking fault density. In this paper, we have used the molecular dynamics simulations to study the formation of the stacking faults in GaN NW along [0001] and [11-20] directions. The results show that under same growth condition the GaN NW along [0001] has stacking fault while there is no stacking fault in GaN NW along [11-20]. We have analysis the possible reason and further study is underway.

源语言英语
主期刊名Computational Materials Science, CMS 2011
950-954
页数5
DOI
出版状态已出版 - 2011
已对外发布
活动2011 International Conference on Computational Materials Science, CMS 2011 - Guangzhou, 中国
期限: 17 4月 201118 4月 2011

出版系列

姓名Advanced Materials Research
268-270
ISSN(印刷版)1022-6680

会议

会议2011 International Conference on Computational Materials Science, CMS 2011
国家/地区中国
Guangzhou
时期17/04/1118/04/11

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