The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films

H. Y. Peng; J. L. Wang; L. Wang; B. Zhou

doi:10.1088/1742-6596/152/1/012016

The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films

H. Y. Peng
, J. L. Wang
, L. Wang
, B. Zhou

物理学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

1 引用（Scopus）

摘要

The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400°C, but the mechanical properties became worse when annealing at 600°C.

源语言	英语
文章编号	012016
期刊	Journal of Physics: Conference Series
卷	152
DOI	https://doi.org/10.1088/1742-6596/152/1/012016
出版状态	已出版 - 2009

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title = "The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films",

abstract = "The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400°C, but the mechanical properties became worse when annealing at 600°C.",

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AU - Peng, H. Y.

AU - Wang, J. L.

AU - Wang, L.

AU - Zhou, B.

PY - 2009

Y1 - 2009

N2 - The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400°C, but the mechanical properties became worse when annealing at 600°C.

AB - The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400°C, but the mechanical properties became worse when annealing at 600°C.

UR - https://www.scopus.com/pages/publications/65749118626

U2 - 10.1088/1742-6596/152/1/012016

DO - 10.1088/1742-6596/152/1/012016

M3 - 文章

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SN - 1742-6588

VL - 152

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

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The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films

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