@inproceedings{2283be78914346a984121e65f55a0876,
title = "Textured characteristic of aluminum nitride films prepared by magnetron sputtering",
abstract = "The oriented AlN films on Si (100) substrates were prepared by reactive magnetron sputtering and were characterized by XRD spectra. It was observed that with decreasing in the sputtering pressure, the c-axis orientation of hexagonal AlN grains in the films varies from paralleling with to perpendicular to the surface of the substrates. From the images of atomic force microscopy, the AlN grains were found having a silkworm-like shape and the long axis was the c-axis of the hexagonal AlN.",
keywords = "Aluminum nitride, Film, Magnetron sputtering, Orientation",
author = "B. Wang and Wang, \{R. Z.\} and M. Wang and Huang, \{A. P.\} and Li, \{X. H.\} and Zhu, \{M. K.\} and H. Yan",
year = "2003",
language = "英语",
isbn = "1880132796",
series = "Mechanics and Material Engineering for Science and Experiments",
pages = "304--307",
editor = "Y. Zhou and Y. Ghu and Z. Li and Y. Zhou and Y. Gu and Z. Li",
booktitle = "Mechanics and Material Engineering for Science and Experiments",
note = "Proceedings of the International Symposium of Young Scholars on Mechanics and Material Engineering for Science and Experiments ; Conference date: 11-08-2001 Through 16-08-2001",
}