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Synthesis and characteristics of p-CuAlO 2/n-Si heterostructure

  • G. B. Dong
  • , M. Zhang*
  • , W. Lan
  • , P. M. Dong
  • , X. P. Zhao
  • , H. Yan
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

In this paper the CuAlO 2/Si heterostructure was synthesized by the radio-frequency magnetron sputtering. The CuAlO 2thin film tends to be oriented on the (001) surface. The positive Hall coefficient confirms p-type nature of the film and the value of hole concentration is found to be around 3.6 × 10 15 cm -3. The contact between the n- and p-type semiconductors was found to be rectifying within the measured temperature range from 320 to 120 K, and the diffusion potential increases with decreasing temperature. The ratio of forward current over the reverse current exceeds 35 within the range of applied voltages of -1.5 to +1.5 V and the turn-on voltage is about 0.5 V.

源语言英语
页(从-至)193-195
页数3
期刊Journal of Materials Science: Materials in Electronics
20
2
DOI
出版状态已出版 - 2009
已对外发布

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