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Residual stress and strain in CdZnTe wafer examined by X-ray diffraction methods

  • D. Zeng*
  • , W. Jie
  • , T. Wang
  • , G. Zha
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

A non-destructive method based on X-ray diffraction was developed to measure the stress and strain in CdZnTe single crystal near the surface. From the experimental results and calculations, the residual stresses in CdZnTe single crystal were determined to be σ1=30 MPa, σ2=14 MPa, and τ12=-4 MPa, respectively. The residual stress derived from the measurement strain in CdZnTe was thought to be composed of the thermal stress, the misfit stress, and the mechanical stress. The distributions of non-uniform strain in a CdZnTe wafer are about 3.9%, while the distributions of uniform strain in the CdZnTe wafer are 0.5%, much smaller than those of the non-uniform strain.

源语言英语
页(从-至)257-260
页数4
期刊Applied Physics A: Materials Science and Processing
86
2
DOI
出版状态已出版 - 2月 2007
已对外发布

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