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Research on physics-of-failure model for electromigration damage accumulation under multi-level stress profile based on accelerated factor

  • Beihang University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The problem which is paid attention in this paper is that existing physics-of-failure model cannot input and calculate complex multi-level stress environmental profile when making simulating calculation of microelectronic devices' using reliability. A physical model for electro-migration failure is analyzed as an example. We make cumulative calculation and improvement using theory of accelerated factor, and the general function of physics-of-failure model for electro-migration damage accumulation under multi-level stress profile is set up. This model can achieve simulation and prediction of cycle time before failure under multi-level stress profile. At the end of this paper, an instance of multi-level stress profile's calculation is provided.

源语言英语
主期刊名2017 2nd International Conference on Reliability Systems Engineering, ICRSE 2017
编辑Dongming Fan, Jun Yang, Ziyao Wang, Tingdi Zhao
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9781538609187
DOI
出版状态已出版 - 8 9月 2017
活动2nd International Conference on Reliability Systems Engineering, ICRSE 2017 - Huairou, Beijing, 中国
期限: 10 7月 201712 7月 2017

出版系列

姓名2017 2nd International Conference on Reliability Systems Engineering, ICRSE 2017

会议

会议2nd International Conference on Reliability Systems Engineering, ICRSE 2017
国家/地区中国
Huairou, Beijing
时期10/07/1712/07/17

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