跳到主要导航 跳到搜索 跳到主要内容

Research on crosstalk issue of through silicon via for 3D integration

  • Beihang University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

This paper focused on the crosstalk analysis of through silicon via (TSV) for 3D integration. It started with the TSV electrical character. A GS TSV pair was established in HFSS and its electrical model was created in ADS. The S-parameter showed a good match between the two methods which validated the electrical model. Crosstalk analysis was an important part in this paper. First, the S-parameter of GSSG-BUMP-RDL model was simulated from 0.1GHz to 20GHz in HFSS, and the NEXT and FEXT crosstalk at 1GHz and 10GHz were given respectively in time domain. Then we added more ground TSV to the model to suppress the crosstalk. And it showed a better capacity to suppress the FEXT crosstalk. Finally, another improved model which used a ground plane to replace the ground RDL was carried out, and it resulted in a better performance to decrease the NEXT crosstalk.

源语言英语
主期刊名Proceedings - 28th IEEE International System on Chip Conference, SOCC 2015
编辑Thomas Buchner, Danella Zhao, Karan Bhatia, Ramalingam Sridhar
出版商IEEE Computer Society
396-400
页数5
ISBN(电子版)9781467390934
DOI
出版状态已出版 - 12 2月 2016
活动28th IEEE International System on Chip Conference, SOCC 2015 - Beijing, 中国
期限: 8 9月 201511 9月 2015

出版系列

姓名International System on Chip Conference
2016-February
ISSN(印刷版)2164-1676
ISSN(电子版)2164-1706

会议

会议28th IEEE International System on Chip Conference, SOCC 2015
国家/地区中国
Beijing
时期8/09/1511/09/15

指纹

探究 'Research on crosstalk issue of through silicon via for 3D integration' 的科研主题。它们共同构成独一无二的指纹。

引用此