TY - JOUR
T1 - Recent progress in patterned silicon nanowire arrays
T2 - Fabrication, properties and applications
AU - Zhang, Yan
AU - Qiu, Teng
AU - Zhang, Wenjun
AU - Chu, Paul K.
PY - 2011
Y1 - 2011
N2 - Currently there is great interest in patterned silicon nanowire arrays and applications. The accurately controlled fabrication of patterned silicon nanowire arrays with the desirable axial crystallographic orientation using simpler and quicker ways is very desirable and of great importance to material synthesis and future nanoscale optoelectronic devices that employ silicon. The recent advances in manipulating patterned silicon nanowire arrays and patents are reviewed with a focus on the progress of nanowire fabrication and applications.
AB - Currently there is great interest in patterned silicon nanowire arrays and applications. The accurately controlled fabrication of patterned silicon nanowire arrays with the desirable axial crystallographic orientation using simpler and quicker ways is very desirable and of great importance to material synthesis and future nanoscale optoelectronic devices that employ silicon. The recent advances in manipulating patterned silicon nanowire arrays and patents are reviewed with a focus on the progress of nanowire fabrication and applications.
KW - Chemical vapor deposition
KW - Field-effect transistor
KW - Molecular beam epitaxy
KW - Patterned silicon nanowire arrays
KW - Selfselective electroless plating
KW - Si solar cells
KW - Thermal conductivity
KW - Thermal evaporation
UR - https://www.scopus.com/pages/publications/79551618826
U2 - 10.2174/187221011794474921
DO - 10.2174/187221011794474921
M3 - 文章
C2 - 21190542
AN - SCOPUS:79551618826
SN - 1872-2105
VL - 5
SP - 62
EP - 70
JO - Recent Patents on Nanotechnology
JF - Recent Patents on Nanotechnology
IS - 1
ER -