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Recent Development of Low Damage Laser Microprocessing on Surface and Subsurface Treatment of Silicon for Industrial Applications

  • Beihang University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Silicon is one of the most commonly used semiconductor materials. However, working with silicon presents challenges due to its high brittleness and hardness. Drilling, milling, dicing, and surface treatment require careful handling. Fortunately, laser processing technology offers a solution. With its high energy density and smaller heat-affected zone, laser processing is well-suited for working with silicon materials. This paper reviews the interaction mechanism between laser and silicon material and its applications. The surface and subsurface treatments are introduced. The surface roughness, microstructure, residual stress, and electrical properties of silicon material after laser microprocessing are investigated. Based on the current research status, we summarize some of the challenges that must be overcome to allow a wider application of laser in the new generation of semiconductor materials.

源语言英语
主期刊名Proceedings of the 3rd International Conference on Advanced Surface Enhancement (INCASE) 2023 - Surface Engineering for Sustainability
编辑Niroj Maharjan, Niroj Maharjan, Wei He
出版商Springer Science and Business Media Deutschland GmbH
129-140
页数12
ISBN(印刷版)9789819986422
DOI
出版状态已出版 - 2024
活动3rd International Conference on Advanced Surface Enhancement, INCASE 2023 - Singapore, 新加坡
期限: 25 9月 202327 9月 2023

出版系列

姓名Lecture Notes in Mechanical Engineering
ISSN(印刷版)2195-4356
ISSN(电子版)2195-4364

会议

会议3rd International Conference on Advanced Surface Enhancement, INCASE 2023
国家/地区新加坡
Singapore
时期25/09/2327/09/23

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