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Proximity-Induced Interfacial Antiferromagnetic Coupling in EuO/KTaO3 Heterostructures with LaTiO3 Buffer Layers

  • Hui Zhang*
  • , Weiliang Qiao
  • , He Bai
  • , Ning Wu
  • , Lu Chen
  • , Fanqi Meng
  • , Yang Ma
  • , Jine Zhang
  • , Furong Han
  • , Huaiwen Yang
  • , Qinghua Zhang
  • , Lin Gu
  • , Banggui Liu
  • , Yuansha Chen
  • , Fengxia Hu
  • , Wei Han
  • , Tao Zhu*
  • , Baogen Shen
  • , Jirong Sun*
  • , Weisheng Zhao*
  • *此作品的通讯作者
  • Peking University
  • Spallation Neutron Source Science Center
  • Chinese Academy of Sciences
  • Beihang University
  • CAS - Institute of Physics
  • University of Chinese Academy of Sciences
  • Songshan Lake Materials Laboratory
  • CAS - Ningbo Institute of Material Technology and Engineering
  • Zhejiang University

科研成果: 期刊稿件文章同行评审

摘要

Artificial oxide heterostructures provide valuable opportunities for tailoring interfacial magnetic coupling, which is a central topic of spintronics. In this work, the antiferromagnetic interfacial magnetic coupling is demonstrated in EuO/KTaO3 (001) heterostructures by introducing a LaTiO3 (LTO) buffer layer. Depth-resolved polarized neutron reflectometry reveals that ferromagnetic EuO induces magnetism in the adjacent LTO buffer layer and the interfacial KTaO3 (KTO) through the magnetic proximity effect (MPE). Remarkably, the introduction of the LTO buffer layer at the EuO/KTO interface results in antiparallel alignment between the interfacial KTO layer and EuO, indicating proximity-induced antiferromagnetic coupling across the spacer layer. Anomalous Hall effect and hysteretic magnetoresistance measurements indicate the presence of spin-polarized 2D electron gases in the interfacial layer of KTO. The maximum thickness of the LTO buffer layer for EuO to be able to magnetize KTO is 8 uc (≈3.2 nm), beyond which no hysteretic magnetoresistance is observed. Density functional theory calculations suggest that antiferromagnetic coupling lowers the system energy in LTO-buffered EuO/KTO heterostructure, corroborating the experimental findings. This work highlights the crucial role of interface engineering in controlling interfacial magnetic coupling, providing novel pathways for designing advanced spintronic devices.

源语言英语
文章编号e06394
期刊Advanced Functional Materials
35
51
DOI
出版状态已出版 - 16 12月 2025

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