Pit growth behavior on aluminum under potentiostatic control

Lei Yao; Jianhua Liu; Songmei Li; Mei Yu

doi:10.1016/s1452-3981(23)08071-9

Pit growth behavior on aluminum under potentiostatic control

Lei Yao
, Jianhua Liu^*
, Songmei Li
, Mei Yu

^*此作品的通讯作者

材料科学与工程学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

The growth behavior of pits on aluminum is studied during potentiostatic etching with current transient measurement, SEM and AFM observation. The results show that there is an induction period for the pit nucleation. The current rises to a maximum and then a plateau appears during the etching. Hemispherical pits form and grow in size before the plateau, and transform into half-cubic pits at the plateau. The change of the pitting behavior is controlled by the current density for pitting.

源语言	英语
页（从-至）	4039-4047
页数	9
期刊	International Journal of Electrochemical Science
卷	9
期	7
DOI	https://doi.org/10.1016/s1452-3981(23)08071-9
出版状态	已出版 - 2014

访问文件

10.1016/s1452-3981(23)08071-9

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{df606c0e386d43558eae9fe55ec35451,

title = "Pit growth behavior on aluminum under potentiostatic control",

abstract = "The growth behavior of pits on aluminum is studied during potentiostatic etching with current transient measurement, SEM and AFM observation. The results show that there is an induction period for the pit nucleation. The current rises to a maximum and then a plateau appears during the etching. Hemispherical pits form and grow in size before the plateau, and transform into half-cubic pits at the plateau. The change of the pitting behavior is controlled by the current density for pitting.",

keywords = "Aluminum, Electrochemical etching, Pitting corrosion, Potentiostatic",

author = "Lei Yao and Jianhua Liu and Songmei Li and Mei Yu",

year = "2014",

doi = "10.1016/s1452-3981(23)08071-9",

language = "英语",

volume = "9",

pages = "4039--4047",

journal = "International Journal of Electrochemical Science",

issn = "1452-3981",

publisher = "Elsevier B.V.",

number = "7",

}

TY - JOUR

T1 - Pit growth behavior on aluminum under potentiostatic control

AU - Yao, Lei

AU - Liu, Jianhua

AU - Li, Songmei

AU - Yu, Mei

PY - 2014

Y1 - 2014

N2 - The growth behavior of pits on aluminum is studied during potentiostatic etching with current transient measurement, SEM and AFM observation. The results show that there is an induction period for the pit nucleation. The current rises to a maximum and then a plateau appears during the etching. Hemispherical pits form and grow in size before the plateau, and transform into half-cubic pits at the plateau. The change of the pitting behavior is controlled by the current density for pitting.

AB - The growth behavior of pits on aluminum is studied during potentiostatic etching with current transient measurement, SEM and AFM observation. The results show that there is an induction period for the pit nucleation. The current rises to a maximum and then a plateau appears during the etching. Hemispherical pits form and grow in size before the plateau, and transform into half-cubic pits at the plateau. The change of the pitting behavior is controlled by the current density for pitting.

KW - Aluminum

KW - Electrochemical etching

KW - Pitting corrosion

KW - Potentiostatic

UR - https://www.scopus.com/pages/publications/84898669499

U2 - 10.1016/s1452-3981(23)08071-9

DO - 10.1016/s1452-3981(23)08071-9

M3 - 文章

AN - SCOPUS:84898669499

SN - 1452-3981

VL - 9

SP - 4039

EP - 4047

JO - International Journal of Electrochemical Science

JF - International Journal of Electrochemical Science

IS - 7

ER -

Pit growth behavior on aluminum under potentiostatic control

摘要

访问文件

其它文件与链接

指纹

引用此