Photocatalytic property of TiO2-xNx thin films prepared by r. f. magnetron sputtering

Shun Li Chen; Xun Gang Diao; Meng Yang; Hai Ying Liu; Tian Min Wang

Photocatalytic property of TiO_2-xN_x thin films prepared by r. f. magnetron sputtering

Shun Li Chen
, Xun Gang Diao
, Meng Yang
, Hai Ying Liu
, Tian Min Wang

能源与动力工程学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

3 引用（Scopus）

摘要

Transparent TiO₂ and TiO_2-xN_x thin films were prepared on glass substrates by r. f. magnetron sputtering. The crystalline structure, surface morphology, photocatalysis of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectrophotometer. The results showed that most TiO_2-xN_x thin films were anatase phase. A new crystalline phase was found in the nitrogen-rich film. The absorption edge of thin films were shifted to the lower-energy region with increasing of N₂/Ar gas flow ratio. The nitrogen-doped TiO₂ thin film prepared with 3:100 sccm N₂/Ar shows better photocatalytic activity at visible light region.

源语言	英语
页（从-至）	464-466
页数	3
期刊	Gongneng Cailiao/Journal of Functional Materials
卷	36
期	3
出版状态	已出版 - 3月 2005

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{1d99d23b67c74b8fb3f6d8bd36153132,

title = "Photocatalytic property of TiO2-xNx thin films prepared by r. f. magnetron sputtering",

abstract = "Transparent TiO2 and TiO2-xNx thin films were prepared on glass substrates by r. f. magnetron sputtering. The crystalline structure, surface morphology, photocatalysis of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectrophotometer. The results showed that most TiO2-xNx thin films were anatase phase. A new crystalline phase was found in the nitrogen-rich film. The absorption edge of thin films were shifted to the lower-energy region with increasing of N2 /Ar gas flow ratio. The nitrogen-doped TiO2 thin film prepared with 3:100 sccm N2/Ar shows better photocatalytic activity at visible light region.",

keywords = "Magnetron sputtering, Nitrogen-doped TiO thin film, Photocatalytic",

author = "Chen, \{Shun Li\} and Diao, \{Xun Gang\} and Meng Yang and Liu, \{Hai Ying\} and Wang, \{Tian Min\}",

year = "2005",

month = mar,

language = "英语",

volume = "36",

pages = "464--466",

journal = "Gongneng Cailiao/Journal of Functional Materials",

issn = "1001-9731",

publisher = "Journal of Functional Materials",

number = "3",

}

TY - JOUR

T1 - Photocatalytic property of TiO2-xNx thin films prepared by r. f. magnetron sputtering

AU - Chen, Shun Li

AU - Diao, Xun Gang

AU - Yang, Meng

AU - Liu, Hai Ying

AU - Wang, Tian Min

PY - 2005/3

Y1 - 2005/3

N2 - Transparent TiO2 and TiO2-xNx thin films were prepared on glass substrates by r. f. magnetron sputtering. The crystalline structure, surface morphology, photocatalysis of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectrophotometer. The results showed that most TiO2-xNx thin films were anatase phase. A new crystalline phase was found in the nitrogen-rich film. The absorption edge of thin films were shifted to the lower-energy region with increasing of N2 /Ar gas flow ratio. The nitrogen-doped TiO2 thin film prepared with 3:100 sccm N2/Ar shows better photocatalytic activity at visible light region.

AB - Transparent TiO2 and TiO2-xNx thin films were prepared on glass substrates by r. f. magnetron sputtering. The crystalline structure, surface morphology, photocatalysis of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectrophotometer. The results showed that most TiO2-xNx thin films were anatase phase. A new crystalline phase was found in the nitrogen-rich film. The absorption edge of thin films were shifted to the lower-energy region with increasing of N2 /Ar gas flow ratio. The nitrogen-doped TiO2 thin film prepared with 3:100 sccm N2/Ar shows better photocatalytic activity at visible light region.

KW - Magnetron sputtering

KW - Nitrogen-doped TiO thin film

KW - Photocatalytic

UR - https://www.scopus.com/pages/publications/18744410958

M3 - 文章

AN - SCOPUS:18744410958

SN - 1001-9731

VL - 36

SP - 464

EP - 466

JO - Gongneng Cailiao/Journal of Functional Materials

JF - Gongneng Cailiao/Journal of Functional Materials

IS - 3

ER -

Photocatalytic property of TiO2-xNx thin films prepared by r. f. magnetron sputtering

摘要

其它文件与链接

学术指纹

引用此

Photocatalytic property of TiO_2-xN_x thin films prepared by r. f. magnetron sputtering