Optimization of the thickness of glass/TiO 2/Ag/Ti/TiO 2/SiON multilayer film

Yu Liu; Cong Wang; Xungang Diao; Yafei Xue

doi:10.1016/j.vacuum.2012.04.044

Optimization of the thickness of glass/TiO ₂/Ag/Ti/TiO ₂/SiON multilayer film

Yu Liu^*
, Cong Wang
, Xungang Diao
, Yafei Xue

^*此作品的通讯作者

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

12 引用（Scopus）

摘要

The TiO ₂/Ag/Ti/TiO ₂/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis-NIR region. The multilayer film achieves maximum transmittance of 92.7% at 690 nm, in which the both TiO ₂ layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary.

源语言	英语
页（从-至）	2040-2043
页数	4
期刊	Vacuum
卷	86
期	12
DOI	https://doi.org/10.1016/j.vacuum.2012.04.044
出版状态	已出版 - 20 7月 2012

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10.1016/j.vacuum.2012.04.044

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title = "Optimization of the thickness of glass/TiO 2/Ag/Ti/TiO 2/SiON multilayer film",

abstract = "The TiO 2/Ag/Ti/TiO 2/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis-NIR region. The multilayer film achieves maximum transmittance of 92.7\% at 690 nm, in which the both TiO 2 layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary.",

keywords = "D/M/D multilayer film, Film thickness, Magnetron sputtering, Optimization, Spectral selectivity, Transmittance",

author = "Yu Liu and Cong Wang and Xungang Diao and Yafei Xue",

year = "2012",

month = jul,

day = "20",

doi = "10.1016/j.vacuum.2012.04.044",

language = "英语",

volume = "86",

pages = "2040--2043",

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T1 - Optimization of the thickness of glass/TiO 2/Ag/Ti/TiO 2/SiON multilayer film

AU - Liu, Yu

AU - Wang, Cong

AU - Diao, Xungang

AU - Xue, Yafei

PY - 2012/7/20

Y1 - 2012/7/20

N2 - The TiO 2/Ag/Ti/TiO 2/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis-NIR region. The multilayer film achieves maximum transmittance of 92.7% at 690 nm, in which the both TiO 2 layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary.

AB - The TiO 2/Ag/Ti/TiO 2/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis-NIR region. The multilayer film achieves maximum transmittance of 92.7% at 690 nm, in which the both TiO 2 layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary.

KW - D/M/D multilayer film

KW - Film thickness

KW - Magnetron sputtering

KW - Optimization

KW - Spectral selectivity

KW - Transmittance

UR - https://www.scopus.com/pages/publications/84862977381

U2 - 10.1016/j.vacuum.2012.04.044

DO - 10.1016/j.vacuum.2012.04.044

M3 - 文章

AN - SCOPUS:84862977381

SN - 0042-207X

VL - 86

SP - 2040

EP - 2043

JO - Vacuum

JF - Vacuum

IS - 12

ER -

Optimization of the thickness of glass/TiO 2/Ag/Ti/TiO 2/SiON multilayer film

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Optimization of the thickness of glass/TiO ₂/Ag/Ti/TiO ₂/SiON multilayer film