Optimal design of quadruple-layer antireflection coating structure for conversion efficiency enhancement in crystalline silicon solar cells

In this paper, we employed a quadruple-layer antireflection coating structure with Al₂O₃ deposited by DC reactive magnetron sputtering and SiO₂ deposited by PECVD (plasma enhanced chemical vapor) deposition as the bottom layer, and proposed an optical optimization program for quadruple-layer antireflection coatings to obtain the structure parameters. In the experiment, two types of optimization quadruple-layer antireflection coatings and typical SiN_x:H double-layer antireflection coatings were deposited on the crystalline silicon solar cells. The reflectance of the silicon solar cell with quadruple-layer antireflection coatings was lower than that of the solar cell with SiN_x:H double-layer antireflection coatings. These results demonstrated the possibility of substituting quadruple-layer antireflection coatings for double-layer antireflection coatings, as well as the feasibility of the application in photovoltaic.