摘要
This paper reports the bulk synthesis route of the aligned and non-aligned high-quality α-Si3N4 nanowires (NWS) which were grown directly from the Si substrate by vapor phase deposition at 1050°. The as-grown products were characterized by employing XRD, SEM, HRTEM and photoluminescence. The microscopic results revealed that the products consist of single crystalline aligned and non-aligned α-Si3N4 NWs having a same diameter range of 30-100 nm and different lengths of about hundreds of microns. The XRD observation revealed that the products consist of α-phase Si3N4 NWs. The room temperature PL spectra indicated that the NWs have good emission property. The non-aligned NWs were formed at lower temperature as compared with aligned NWs. Our method is a simple and one-step procedure to synthesize the bulk-quantity and high-purity aligned and non-aligned α-Si3N4 NWs at a relatively low temperature. The possible growth mechanism was also briefly discussed.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1-5 |
| 页数 | 5 |
| 期刊 | Science in China, Series E: Technological Sciences |
| 卷 | 52 |
| 期 | 1 |
| DOI | |
| 出版状态 | 已出版 - 1月 2009 |
| 已对外发布 | 是 |
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