TY - GEN
T1 - Notice of Removal
T2 - 2017 IEEE International Ultrasonics Symposium, IUS 2017
AU - Taguett, Amine
AU - Aubert, Thierry
AU - Elmazria, Omar
AU - Bartoli, Florian
AU - Lomello, Marc
AU - Hehn, Michel
AU - Mangin, Stephane
AU - Xu, Yong
N1 - Publisher Copyright:
© 2017 IEEE.
PY - 2017/10/31
Y1 - 2017/10/31
N2 - We previously demonstrated the potential of IrxRh1-x thin films (x < 0.5) as electrodes for high-temperature surface acoustic waves (SAW) applications [1]. To remind, we observed that after a 4-days annealing period at 800°C under air atmosphere, these films oxidize to form IrxRh1-xO2 films, which exhibit a resistivity suitable for the targeted application, especially as the Ir rate is high (ρ 180 μΩ·cm for x = 0.5). Consequently, the first aim of this work is to study the most promising Ir-rich compositions (0.7 < × < 1). Moreover, as it is well know that pure Ir transforms into volatile IrO3 in the vicinity of 800°C [2], we also investigate the interest of alloying Ir with Rh regarding this degradation effect. Finally, we examine the reliability of SAW devices based on IrxRh1-x electrodes and Langasite (LGS) substrate during a 20-days annealing period between 800 and 950°C.
AB - We previously demonstrated the potential of IrxRh1-x thin films (x < 0.5) as electrodes for high-temperature surface acoustic waves (SAW) applications [1]. To remind, we observed that after a 4-days annealing period at 800°C under air atmosphere, these films oxidize to form IrxRh1-xO2 films, which exhibit a resistivity suitable for the targeted application, especially as the Ir rate is high (ρ 180 μΩ·cm for x = 0.5). Consequently, the first aim of this work is to study the most promising Ir-rich compositions (0.7 < × < 1). Moreover, as it is well know that pure Ir transforms into volatile IrO3 in the vicinity of 800°C [2], we also investigate the interest of alloying Ir with Rh regarding this degradation effect. Finally, we examine the reliability of SAW devices based on IrxRh1-x electrodes and Langasite (LGS) substrate during a 20-days annealing period between 800 and 950°C.
UR - https://www.scopus.com/pages/publications/85039423774
U2 - 10.1109/ULTSYM.2017.8091906
DO - 10.1109/ULTSYM.2017.8091906
M3 - 会议稿件
AN - SCOPUS:85039423774
T3 - IEEE International Ultrasonics Symposium, IUS
BT - 2017 IEEE International Ultrasonics Symposium, IUS 2017
PB - IEEE Computer Society
Y2 - 6 September 2017 through 9 September 2017
ER -