摘要
Infrared photodetectors are widely used in the field of remote sensing, communications, biomedical imaging, etc. Most photodetection based on 2D transition-metal dichalcogenides (TMDs) is limited to the visible (Vis) to near-infrared (NIR) due to large intrinsic bandgaps (≈1.2–2 eV). Here, a bandgap engineering of HfS2 by a tellurium (Te)-replacement strategy is obtained via chemical vapor transport method. The bandgap values of HfS2(1−x)Te2x decrease from 1.7 to 0.88 eV with Te composition changing from 0 to 0.095. Few-layer HfS1.81Te0.19 based field-effect transistors exhibit a high current on/off ratio of 106 and decent electron mobility of 12.6 cm2 V−1 s−1 at room temperature. The photodetectors show a responsivity of 2 A W−1 with a remarkable photocurrent of ≈3 μA and a fast response speed of 8.8/75 ms at 830 nm simultaneously. Further, the response spectrum of HfS2(1−x)Te2x based photodetectors is broadened from Vis to short-wavelength infrared (SWIR), covering the free-space laser communications wavelength and the second NIR region in medicine. Bandgap engineering of 2D TMDs proposed in this work offer a promising route to develop bandgap-variable 2D materials for infrared photodetection applications.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 2002248 |
| 期刊 | Advanced Optical Materials |
| 卷 | 9 |
| 期 | 11 |
| DOI | |
| 出版状态 | 已出版 - 4 6月 2021 |
| 已对外发布 | 是 |
学术指纹
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