@inproceedings{53b10f327de544cb90e74d714e9c253d,
title = "Nanostructures and nanodevices special fabrication and characterization",
abstract = "The nanostructures and nanodevices special fabrication technology including electron beam lithography (EBL), focused ion beam (FIB) technology, microcontact printing (μCP) and nanoimprinting were introduced in this paper. The examples of Y-shape waveguide coupler and high precision nanopattern of China Seal were designed and fabricated based the EBL and FIB technology respectively. Their structures can be characterized by scanning electron microscopy (SEM), scanning tunnel microscopy (STM) and atom force microscopy (AFM) etc. The C60 molecular on a Si (111)-(7×7) surface in variable temperature is deposited and detected by STM. The fabricated pattern and structures results indicated that the novel fabrication and characterization technology is very important and effective tools in nanoscale science field.",
keywords = "Atom force microscopy, Electron beam lithography, Focused ion beam, Nanodevices, Nanostructures, Scanning tunnel microscopy",
author = "Wang, \{Guang Long\} and Min Gao and Feng, \{Li Shuang\} and Yi Dun and Hou, \{Jian Guo\} and Jie Tang",
year = "2011",
doi = "10.4028/www.scientific.net/KEM.483.243",
language = "英语",
isbn = "9783037851753",
series = "Key Engineering Materials",
publisher = "Trans Tech Publications Ltd",
pages = "243--248",
booktitle = "MEMS/NEMS Nano Technology",
address = "瑞士",
}