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Multiple parametric nanoscale measurements with high sensitivity based on through-focus scanning optical microscopy

  • R. Peng
  • , Y. Qu
  • , J. Hao
  • , H. Pan
  • , J. Niu
  • , J. Jiang*
  • *此作品的通讯作者
  • Beihang University
  • CAS - Institute of Microelectronics

科研成果: 期刊稿件文章同行评审

摘要

High-throughput through-focus scanning optical microscopy (TSOM) involves defocusing along the optical axis and capturing a series of defocus images and is useful in optical nanoscale measurement. However, TSOM is usually affected by its optical and mechanical noises. In this study, the issue of sensitivity and application in three-dimensional (3D) multiple parameter measurement of TSOM is investigated. First, a TSOM system with objective scanning and its relative simulation algorithm are proposed. Second, based upon the system and algorithm, an experiment on an isolated Au line is performed and the corresponding matching library is established. Comparing the experimental TSOM image and simulated TSOM images of the library, 3D multiple parameter results of the Au line are extracted. Third, the precision of the system is analysed through a fidelity test particular for through-focus images. According to this study, the system is robust to the optical and mechanical noises and hence could be useful in 3D multiple parametric measurement and high-volume nanomanufacturing.

源语言英语
页(从-至)139-149
页数11
期刊Journal of Microscopy
274
3
DOI
出版状态已出版 - 6月 2019

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