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Molecular beam epitaxy growth and optical properties of single crystal Zn3N2 films

  • Peng Wu
  • , T. Tiedje
  • , H. Alimohammadi
  • , V. Bahrami-Yekta
  • , M. Masnadi-Shirazi
  • , Cong Wang

科研成果: 期刊稿件文章同行评审

摘要

Single crystal Zn3N2 films with (100) orientation have been grown by plasma-assisted molecular beam epitaxy on MgO and A-plane sapphire substrates with in situ optical reflectance monitoring of the growth. The optical bandgap was found to be 1.25-1.28 eV and an electron Hall mobility as high as 395 cm2 V-1 s-1 was measured. The films were n-type with carrier concentrations in the 1018-1019 cm-3 range.

源语言英语
文章编号10LT01
期刊Semiconductor Science and Technology
31
10
DOI
出版状态已出版 - 15 9月 2016

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