摘要
Single crystal Zn3N2 films with (100) orientation have been grown by plasma-assisted molecular beam epitaxy on MgO and A-plane sapphire substrates with in situ optical reflectance monitoring of the growth. The optical bandgap was found to be 1.25-1.28 eV and an electron Hall mobility as high as 395 cm2 V-1 s-1 was measured. The films were n-type with carrier concentrations in the 1018-1019 cm-3 range.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 10LT01 |
| 期刊 | Semiconductor Science and Technology |
| 卷 | 31 |
| 期 | 10 |
| DOI | |
| 出版状态 | 已出版 - 15 9月 2016 |
指纹
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