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Modulating the Schottky barriers in MoS 2 /MXenes heterostructures via surface functionalization and electric field

科研成果: 期刊稿件文章同行评审

摘要

Controlling the Schottky barriers (SB) in semiconductor/metal heterostructures is greatly vital to improve the performance of field effect transistors. Yet the modulation mechanisms have not been well understood. In this work, on the basis of first-principles calculations, we have demonstrated that both surface functionalization and external electric fields (E ext ) play significant roles in modulating the contact types (n-type or p-type) and SB heights at the interface by using the contact between MoS 2 and Nb 2 C-based MXenes as a case study. The results show that weak van der Waals (vdW) interactions dominate between the interlayer. Importantly, the n-type SB-free contact is available in OH-terminated Nb 2 C/MoS 2 heterostructure and continuously controllable p-type SB is found in the MoS 2 /Nb 2 CO 2 and MoS 2 /Nb 2 CF 2 heterostructures under proper vertical E ext strength. We unraveled that the modulation of Schottky barrier originates from the tunable metal work function induced by functionalized termination and the variable interface potential step induced by external electric field. Our work provides important clues for contact engineering and improvement of the MoS 2 device performance.

源语言英语
页(从-至)199-204
页数6
期刊Applied Surface Science
480
DOI
出版状态已出版 - 30 6月 2019

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