Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

X. Wang; J. Wang; S. Yang

doi:10.1179/1432891714Z.000000000871

Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

X. Wang
, J. Wang^*
, S. Yang

^*此作品的通讯作者

物理学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

2 引用（Scopus）

摘要

In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

源语言	英语
页（从-至）	S41017-S41020
期刊	Materials Research Innovations
卷	18
DOI	https://doi.org/10.1179/1432891714Z.000000000871
出版状态	已出版 - 1 7月 2014

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title = "Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method",

abstract = "In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.",

keywords = "Finite element method, Hydrogenated nanocrystalline silicon thin, Mechanical properties",

author = "X. Wang and J. Wang and S. Yang",

note = "Publisher Copyright: {\textcopyright} W. S. Maney \& Son Ltd. 2014.",

year = "2014",

month = jul,

day = "1",

doi = "10.1179/1432891714Z.000000000871",

language = "英语",

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TY - JOUR

T1 - Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

AU - Wang, X.

AU - Wang, J.

AU - Yang, S.

PY - 2014/7/1

Y1 - 2014/7/1

N2 - In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

AB - In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

KW - Finite element method

KW - Hydrogenated nanocrystalline silicon thin

KW - Mechanical properties

UR - https://www.scopus.com/pages/publications/84907821801

U2 - 10.1179/1432891714Z.000000000871

DO - 10.1179/1432891714Z.000000000871

M3 - 文章

AN - SCOPUS:84907821801

SN - 1432-8917

VL - 18

SP - S41017-S41020

JO - Materials Research Innovations

JF - Materials Research Innovations

ER -

Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

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