Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

Guoju Wang; Bo Wang; Anping Huang; Shilong Xu; Mankang Zhu; Biben Wang; Hui Yan

doi:10.1016/j.matlet.2004.03.018

Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

Guoju Wang
, Bo Wang^*
, Anping Huang
, Shilong Xu
, Mankang Zhu
, Biben Wang^*
, Hui Yan

^*此作品的通讯作者

Beijing University of Technology
Liaocheng University

科研成果: 期刊稿件 › 文章 › 同行评审

7 引用（Scopus）

摘要

In this work, crystalline AlN films were successfully synthesized on Si (100) by bias-enhanced catalytic chemical vapor deposition (Cat-CVD) at a low substrate temperature of 400°C. The films were characterized by Fourier Transformation Infrared (FTIR) spectroscopy and X-ray diffraction (XRD). The results indicate that the bias plays an important role in enhancing the crystallinity of the AlN films. Furthermore, it was observed that the crystalline AlN films with small grains of 20 nm could be obtained under the negative bias of 400 V. The effects of the bias on the growth of the crystalline films and the grain size are discussed in detail.

源语言	英语
页（从-至）	2486-2488
页数	3
期刊	Materials Letters
卷	58
期	20
DOI	https://doi.org/10.1016/j.matlet.2004.03.018
出版状态	已出版 - 8月 2004
已对外发布	是

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@article{4472b308f8bc438bbb4482c8dd456c21,

title = "Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD",

abstract = "In this work, crystalline AlN films were successfully synthesized on Si (100) by bias-enhanced catalytic chemical vapor deposition (Cat-CVD) at a low substrate temperature of 400°C. The films were characterized by Fourier Transformation Infrared (FTIR) spectroscopy and X-ray diffraction (XRD). The results indicate that the bias plays an important role in enhancing the crystallinity of the AlN films. Furthermore, it was observed that the crystalline AlN films with small grains of 20 nm could be obtained under the negative bias of 400 V. The effects of the bias on the growth of the crystalline films and the grain size are discussed in detail.",

keywords = "AlN films, Cat-CVD, Crystalline, Negative bias",

author = "Guoju Wang and Bo Wang and Anping Huang and Shilong Xu and Mankang Zhu and Biben Wang and Hui Yan",

year = "2004",

month = aug,

doi = "10.1016/j.matlet.2004.03.018",

language = "英语",

volume = "58",

pages = "2486--2488",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "20",

}

TY - JOUR

T1 - Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

AU - Wang, Guoju

AU - Wang, Bo

AU - Huang, Anping

AU - Xu, Shilong

AU - Zhu, Mankang

AU - Wang, Biben

AU - Yan, Hui

PY - 2004/8

Y1 - 2004/8

N2 - In this work, crystalline AlN films were successfully synthesized on Si (100) by bias-enhanced catalytic chemical vapor deposition (Cat-CVD) at a low substrate temperature of 400°C. The films were characterized by Fourier Transformation Infrared (FTIR) spectroscopy and X-ray diffraction (XRD). The results indicate that the bias plays an important role in enhancing the crystallinity of the AlN films. Furthermore, it was observed that the crystalline AlN films with small grains of 20 nm could be obtained under the negative bias of 400 V. The effects of the bias on the growth of the crystalline films and the grain size are discussed in detail.

AB - In this work, crystalline AlN films were successfully synthesized on Si (100) by bias-enhanced catalytic chemical vapor deposition (Cat-CVD) at a low substrate temperature of 400°C. The films were characterized by Fourier Transformation Infrared (FTIR) spectroscopy and X-ray diffraction (XRD). The results indicate that the bias plays an important role in enhancing the crystallinity of the AlN films. Furthermore, it was observed that the crystalline AlN films with small grains of 20 nm could be obtained under the negative bias of 400 V. The effects of the bias on the growth of the crystalline films and the grain size are discussed in detail.

KW - AlN films

KW - Cat-CVD

KW - Crystalline

KW - Negative bias

UR - https://www.scopus.com/pages/publications/2942624202

U2 - 10.1016/j.matlet.2004.03.018

DO - 10.1016/j.matlet.2004.03.018

M3 - 文章

AN - SCOPUS:2942624202

SN - 0167-577X

VL - 58

SP - 2486

EP - 2488

JO - Materials Letters

JF - Materials Letters

IS - 20

ER -

Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

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