Interdiffusion study in the Nb-Si binary system

Junying Yang; Haixia Wei; Chungen Zhou

doi:10.1142/S0217979210066264

Interdiffusion study in the Nb-Si binary system

Junying Yang^*
, Haixia Wei
, Chungen Zhou

^*此作品的通讯作者

材料科学与工程学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Diffusion experiments on Nb/Si couples were conducted at 1050°C, 1150°C, 1250°C for annealing for 8h, 10h and 15h. Two intermediate phases, NbSi2 and Nb5Si3, were found to develop and grow as parallel layers in the Nb/Si couples, according to the parabolic rate law. The diffusion properties of the different phases were evaluated in terms of alternative theories, which were demonstrated to be equivalent algebraically but complementary because they are expressed in terms of different experimental variables.

源语言	英语
页（从-至）	3167-3172
页数	6
期刊	International Journal of Modern Physics B
卷	24
期	15-16
DOI	https://doi.org/10.1142/S0217979210066264
出版状态	已出版 - 30 6月 2010

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abstract = "Diffusion experiments on Nb/Si couples were conducted at 1050°C, 1150°C, 1250°C for annealing for 8h, 10h and 15h. Two intermediate phases, NbSi2 and Nb5Si3, were found to develop and grow as parallel layers in the Nb/Si couples, according to the parabolic rate law. The diffusion properties of the different phases were evaluated in terms of alternative theories, which were demonstrated to be equivalent algebraically but complementary because they are expressed in terms of different experimental variables.",

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N2 - Diffusion experiments on Nb/Si couples were conducted at 1050°C, 1150°C, 1250°C for annealing for 8h, 10h and 15h. Two intermediate phases, NbSi2 and Nb5Si3, were found to develop and grow as parallel layers in the Nb/Si couples, according to the parabolic rate law. The diffusion properties of the different phases were evaluated in terms of alternative theories, which were demonstrated to be equivalent algebraically but complementary because they are expressed in terms of different experimental variables.

AB - Diffusion experiments on Nb/Si couples were conducted at 1050°C, 1150°C, 1250°C for annealing for 8h, 10h and 15h. Two intermediate phases, NbSi2 and Nb5Si3, were found to develop and grow as parallel layers in the Nb/Si couples, according to the parabolic rate law. The diffusion properties of the different phases were evaluated in terms of alternative theories, which were demonstrated to be equivalent algebraically but complementary because they are expressed in terms of different experimental variables.

KW - Kinetics

KW - diffusion theory

KW - interdiffusion

KW - silicide

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Interdiffusion study in the Nb-Si binary system

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