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Integration of high-performance spin-orbit torque MRAM devices by 200-mm-wafer manufacturing platform

  • Hongchao Zhang
  • , Xiangyue Ma
  • , Chuanpeng Jiang
  • , Jialiang Yin
  • , Shuqin Lyu
  • , Shiyang Lu
  • , Xiantao Shang
  • , Bowen Man
  • , Cong Zhang
  • , Dandan Li
  • , Shuhui Li
  • , Wenjing Chen
  • , Hongxi Liu*
  • , Gefei Wang*
  • , Kaihua Cao*
  • , Zhaohao Wang
  • , Weisheng Zhao
  • *此作品的通讯作者
  • Beihang University
  • Truth Memory Corporation

科研成果: 期刊稿件文章同行评审

摘要

We demonstrate in-plane field-free-switching spin-orbit torque (SOT) magnetic tunnel junction (MTJ) devices that are capable of low switching current density, fast speed, high reliability, and, most importantly, manufactured uniformly by the 200-mm-wafer platform. The performance of the devices is systematically studied, including their magnetic properties, switching behaviors, endurance and data retention. The successful integration of SOT devices within the 200-mm-wafer manufacturing platform provides a feasible way to industrialize SOT MRAMs. It is expected to obtain excellent performance of the devices by further optimizing the MTJ film stacks and the corresponding fabrication processes in the future.

源语言英语
文章编号102501
期刊Journal of Semiconductors
43
10
DOI
出版状态已出版 - 10月 2022

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