TY - JOUR
T1 - Influence of oxygen partial pressure on magnetron sputtered Sr0.8Nd0.3Bi2.5Ta2O9+x ferroelectric thin films
AU - Li, Yibin
AU - Zhang, Sam
AU - Sritharan, Thirumany
AU - Liu, Yang
AU - Chen, T. P.
PY - 2008/6/12
Y1 - 2008/6/12
N2 - During magnetron sputtering deposition of SrBi2Ta2O9 thin films, oxygen gas is introduced in the deposition chamber to compensate the oxygen loss during sputtering. In this paper, the influence of oxygen partial pressure is systematically investigated in sputtering of Sr0.8Nd0.3Bi2.5Ta2O9+x thin films, using X-ray diffraction, X-ray photoelectron spectroscopy and field emission scanning electron microscopy. The studies confirm that at various oxygen partial pressure Nd3+ ions substitute into the bismuth layered perovskite structure, preferentially at the Sr2+ site. The deposition rate, composition, microstructure and polarization properties of the films highly depend on the oxygen partial pressure.
AB - During magnetron sputtering deposition of SrBi2Ta2O9 thin films, oxygen gas is introduced in the deposition chamber to compensate the oxygen loss during sputtering. In this paper, the influence of oxygen partial pressure is systematically investigated in sputtering of Sr0.8Nd0.3Bi2.5Ta2O9+x thin films, using X-ray diffraction, X-ray photoelectron spectroscopy and field emission scanning electron microscopy. The studies confirm that at various oxygen partial pressure Nd3+ ions substitute into the bismuth layered perovskite structure, preferentially at the Sr2+ site. The deposition rate, composition, microstructure and polarization properties of the films highly depend on the oxygen partial pressure.
KW - Magnetron sputtering
KW - Oxygen partial pressure
KW - Polarization property
KW - SrBiTaO thin film
KW - Substitution
UR - https://www.scopus.com/pages/publications/42649128085
U2 - 10.1016/j.jallcom.2007.03.095
DO - 10.1016/j.jallcom.2007.03.095
M3 - 文章
AN - SCOPUS:42649128085
SN - 0925-8388
VL - 457
SP - 549
EP - 554
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
IS - 1-2
ER -