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Improving the electrical conductivity of CuCrO 2 thin film by N doping

  • Guobo Dong
  • , Ming Zhang*
  • , Xueping Zhao
  • , Hui Yan
  • , Chunyu Tian
  • , Yonggang Ren
  • *此作品的通讯作者
  • Beijing University of Technology
  • China North Nuclear Fuel Co. Ltd.

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

N-doped CuCrO 2 thin films were prepared by using radio frequency magnetron sputtering technique. The XRD and XPS measurements were used to confirm the existence of the N acceptors in CuCrO 2 thin films. Hall measurements show the p-type conduction for all films. The electrical conductivity increases rapidly with the increase in N doping concentration, and the maximum of the electrical conductivity of 17 S cm -1 is achieved for the film deposited with 30 vol.% N 2 O, which is about three orders of magnitude higher than that of the undoped CuCrO 2 thin film. Upon increasing the doping concentrations the band gaps of N-doped CuCrO 2 thin films increase due to the Burstein-Moss shift.

源语言英语
页(从-至)4121-4124
页数4
期刊Applied Surface Science
卷256
期13
DOI
出版状态已出版 - 15 4月 2010
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