摘要
N-doped CuCrO 2 thin films were prepared by using radio frequency magnetron sputtering technique. The XRD and XPS measurements were used to confirm the existence of the N acceptors in CuCrO 2 thin films. Hall measurements show the p-type conduction for all films. The electrical conductivity increases rapidly with the increase in N doping concentration, and the maximum of the electrical conductivity of 17 S cm -1 is achieved for the film deposited with 30 vol.% N 2 O, which is about three orders of magnitude higher than that of the undoped CuCrO 2 thin film. Upon increasing the doping concentrations the band gaps of N-doped CuCrO 2 thin films increase due to the Burstein-Moss shift.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 4121-4124 |
| 页数 | 4 |
| 期刊 | Applied Surface Science |
| 卷 | 256 |
| 期 | 13 |
| DOI | |
| 出版状态 | 已出版 - 15 4月 2010 |
| 已对外发布 | 是 |
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