Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation

A. P. Huang; Z. F. Di; Ricky K.Y. Fu; Paul K. Chu

doi:10.1016/j.surfcoat.2006.09.330

Improvement of interfacial and microstructure properties of high-k ZrO₂ thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation

A. P. Huang
, Z. F. Di
, Ricky K.Y. Fu
, Paul K. Chu^*

^*此作品的通讯作者

City University of Hong Kong

科研成果: 期刊稿件 › 文章 › 同行评审

18 引用（Scopus）

摘要

We investigate the microstructure and interfacial characteristics of nitrogen plasma-nitrided ZrO₂ thin films deposited on p-type Si (100) wafers by cathodic arc deposition. The results show that the incorporation of a small amount of N into ZrO₂ can improve the thermal stability of the thin films. High resolution transmission electron microscopy micrographs further confirm that the nitrided film remains amorphous and the interfacial layer has been essentially suppressed. The effects and underlying mechanism are discussed.

源语言	英语
页（从-至）	8282-8285
页数	4
期刊	Surface and Coatings Technology
卷	201
期	19-20 SPEC. ISS.
DOI	https://doi.org/10.1016/j.surfcoat.2006.09.330
出版状态	已出版 - 5 8月 2007
已对外发布	是

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10.1016/j.surfcoat.2006.09.330

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@article{78e93d3f910c4729a2c6063aa21f24b6,

title = "Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation",

abstract = "We investigate the microstructure and interfacial characteristics of nitrogen plasma-nitrided ZrO2 thin films deposited on p-type Si (100) wafers by cathodic arc deposition. The results show that the incorporation of a small amount of N into ZrO2 can improve the thermal stability of the thin films. High resolution transmission electron microscopy micrographs further confirm that the nitrided film remains amorphous and the interfacial layer has been essentially suppressed. The effects and underlying mechanism are discussed.",

keywords = "Microstructure, Plasma nitridation, ZrO",

author = "Huang, \{A. P.\} and Di, \{Z. F.\} and Fu, \{Ricky K.Y.\} and Chu, \{Paul K.\}",

year = "2007",

month = aug,

day = "5",

doi = "10.1016/j.surfcoat.2006.09.330",

language = "英语",

volume = "201",

pages = "8282--8285",

journal = "Surface and Coatings Technology",

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publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation

AU - Huang, A. P.

AU - Di, Z. F.

AU - Fu, Ricky K.Y.

AU - Chu, Paul K.

PY - 2007/8/5

Y1 - 2007/8/5

N2 - We investigate the microstructure and interfacial characteristics of nitrogen plasma-nitrided ZrO2 thin films deposited on p-type Si (100) wafers by cathodic arc deposition. The results show that the incorporation of a small amount of N into ZrO2 can improve the thermal stability of the thin films. High resolution transmission electron microscopy micrographs further confirm that the nitrided film remains amorphous and the interfacial layer has been essentially suppressed. The effects and underlying mechanism are discussed.

AB - We investigate the microstructure and interfacial characteristics of nitrogen plasma-nitrided ZrO2 thin films deposited on p-type Si (100) wafers by cathodic arc deposition. The results show that the incorporation of a small amount of N into ZrO2 can improve the thermal stability of the thin films. High resolution transmission electron microscopy micrographs further confirm that the nitrided film remains amorphous and the interfacial layer has been essentially suppressed. The effects and underlying mechanism are discussed.

KW - Microstructure

KW - Plasma nitridation

KW - ZrO

UR - https://www.scopus.com/pages/publications/34447520151

U2 - 10.1016/j.surfcoat.2006.09.330

DO - 10.1016/j.surfcoat.2006.09.330

M3 - 文章

AN - SCOPUS:34447520151

SN - 0257-8972

VL - 201

SP - 8282

EP - 8285

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 19-20 SPEC. ISS.

ER -

Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation

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Improvement of interfacial and microstructure properties of high-k ZrO₂ thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation