Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation

Qiu Yuan Lu; Liu He Li; Jian Hui Li; Ricky K.Y. Fu; Paul K. Chu

doi:10.1063/1.3204697

Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation

Qiu Yuan Lu
, Liu He Li
, Jian Hui Li
, Ricky K.Y. Fu
, Paul K. Chu

机械工程及自动化学院

科研成果: 期刊稿件 › 文章 › 同行评审

11 引用（Scopus）

摘要

The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.

源语言	英语
文章编号	061503
期刊	Applied Physics Letters
卷	95
期	6
DOI	https://doi.org/10.1063/1.3204697
出版状态	已出版 - 2009

访问文件

10.1063/1.3204697

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{0c48658d675f449fa22fef8fa238b91d,

title = "Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation",

abstract = "The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.",

author = "Lu, \{Qiu Yuan\} and Li, \{Liu He\} and Li, \{Jian Hui\} and Fu, \{Ricky K.Y.\} and Chu, \{Paul K.\}",

year = "2009",

doi = "10.1063/1.3204697",

language = "英语",

volume = "95",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "6",

}

TY - JOUR

T1 - Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation

AU - Lu, Qiu Yuan

AU - Li, Liu He

AU - Li, Jian Hui

AU - Fu, Ricky K.Y.

AU - Chu, Paul K.

PY - 2009

Y1 - 2009

N2 - The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.

AB - The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.

UR - https://www.scopus.com/pages/publications/69049108809

U2 - 10.1063/1.3204697

DO - 10.1063/1.3204697

M3 - 文章

AN - SCOPUS:69049108809

SN - 0003-6951

VL - 95

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 6

M1 - 061503

ER -

Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation

摘要

访问文件

其它文件与链接

指纹

引用此