摘要
Recent breakthroughs in transmission electron microscopy enable a direct quantitative determination of the technologically significant heterointerfaces, yet a direct interpretation is not always possible. Here, we review the general processes to introduce the high-precision first-principles calculations into the microscopy in order to obtain an atomistic understanding of effects of buried interfaces on a wide range of properties. We demonstrate the possibility and important advance of this combined method in relating interface structures to device physics even for the complex heterointerfaces, SiC/Ti3SiC 2, LaxSr1-xO/(SrTiO3)n, and Pd/ZnO presented here. We therefore believe that this approach should be widely applicable to many other interfaces and a range of materials, providing new insights into many long-standing unresolved issues regarding interfaces.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 783-793 |
| 页数 | 11 |
| 期刊 | Journal of the Ceramic Society of Japan |
| 卷 | 119 |
| 期 | 1395 |
| DOI | |
| 出版状态 | 已出版 - 11月 2011 |
| 已对外发布 | 是 |
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