Growth and characterization of TiO₂/TiN camouflage films with low infrared emission on polymide substrates

The TiO₂/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide (PI). The microstructures and properties of the TiO₂/TiN camouflage thin films were characterized with scanning electron microscopy (SEM), infrared emission spectroscopy and ultraviolet visible spectroscopy (UV-Vis). The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.