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Fluence dependence of surface morphology and deuterium retention in w bulks and nanocrystalline w films exposed to deuterium plasma

  • Jing Yan
  • , Xia Li
  • , Kaigui Zhu*
  • *此作品的通讯作者
  • Beihang University

科研成果: 期刊稿件文章同行评审

摘要

The surface morphology of pure W bulks and nanocrystalline tungsten films was investigated after exposure to a low‐energy (100 eV/D), high‐flux (1.8 × 1021 D m−2s−1) deuterium plasma. Nanocrystalline tungsten films of 6 μm thickness were deposited on tungsten bulks and exposed to deuterium plasma at various fluences ranging from 1.30 × 1025 to 5.18 × 1025 D m−2. Changes in surface morphology from before to after irradiation were studied with scanning electron microscopy (SEM). The W bulk exposed to low‐fluence plasma (1.30 × 1025 D m−2) shows blisters. The blisters on the W bulk irradiated to higher‐fluence plasma are much larger (~2 μm). The blisters on the surface of W films are smaller in size and lower in density than those of the W bulks. In addition, the modifications exhibit the appearance of cracks below the surface after deuterium plasma irradiation. It is suggested that the blisters are caused by the diffusion and aggregation of the deuterium‐vacancy clusters. The deuterium retention of the W bulks and nanocrystalline tungsten films was studied using thermal desorption spectroscopy (TDS). The retention of deuterium in W bulks and W films increases with increasing deuterium plasma fluence when irradiated at 500 K.

源语言英语
文章编号1619
页(从-至)1-12
页数12
期刊Applied Sciences (Switzerland)
11
4
DOI
出版状态已出版 - 2 2月 2021

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