Fabrication of Cu1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

Linlin Quan; Weiping Li; Liqun Zhu; Xiaowen Chang; Huicong Liu

doi:10.1039/c4ra04082a

Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

Linlin Quan
, Weiping Li^*
, Liqun Zhu
, Xiaowen Chang
, Huicong Liu

^*此作品的通讯作者

材料科学与工程学院

Beihang University

科研成果: 期刊稿件 › 文章 › 同行评审

23 引用（Scopus）

摘要

We demonstrate a method for fabricating a Cu_1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu _1.8S/CuS CE with a η value of 3.22% are much higher than those of Pt and conventional Cu₂S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.

源语言	英语
页（从-至）	32214-32220
页数	7
期刊	RSC Advances
卷	4
期	61
DOI	https://doi.org/10.1039/c4ra04082a
出版状态	已出版 - 2014

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10.1039/c4ra04082a

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abstract = "We demonstrate a method for fabricating a Cu1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu 1.8S/CuS CE with a η value of 3.22\% are much higher than those of Pt and conventional Cu2S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.",

author = "Linlin Quan and Weiping Li and Liqun Zhu and Xiaowen Chang and Huicong Liu",

year = "2014",

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T1 - Fabrication of Cu1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

AU - Quan, Linlin

AU - Li, Weiping

AU - Zhu, Liqun

AU - Chang, Xiaowen

AU - Liu, Huicong

PY - 2014

Y1 - 2014

N2 - We demonstrate a method for fabricating a Cu1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu 1.8S/CuS CE with a η value of 3.22% are much higher than those of Pt and conventional Cu2S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.

AB - We demonstrate a method for fabricating a Cu1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu 1.8S/CuS CE with a η value of 3.22% are much higher than those of Pt and conventional Cu2S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.

UR - https://www.scopus.com/pages/publications/84905706152

U2 - 10.1039/c4ra04082a

DO - 10.1039/c4ra04082a

M3 - 文章

AN - SCOPUS:84905706152

SN - 2046-2069

VL - 4

SP - 32214

EP - 32220

JO - RSC Advances

JF - RSC Advances

IS - 61

ER -

Fabrication of Cu1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

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Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells