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Exposure of Equal-Channel Angular Extruded Tungsten to Deuterium Plasma

  • Feng Liu
  • , Yuping Xu
  • , Haishan Zhou
  • , Sixiang Zhao
  • , Bo Li
  • , Guanghong Lyu
  • , Yue Yuan
  • , Ting Hao
  • , Guangnan Luo*
  • *此作品的通讯作者
  • CAS - Institute of Plasma Physics
  • Beihang University
  • CAS - Institute of Solid State Physics
  • Chinese Academy of Sciences
  • Hefei Center for Physical Science and Technology

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Surface morphology and deuterium retention in ultrafine-grained tungsten fabricated by equal-channel angular pressing (ECAP) have been examined after exposure to a low energy, high-flux deuterium (D) plasma at fluences of 3×1024 D/m2 and 1×1025 D/m2 in a temperature range of 100°C-150°C. The methods used were scanning electron microscopy (SEM) and thermal desorption spectroscopy (TDS). Sparse and small blisters (∼0.1 μm) were observed by SEM after D plasma irradiation on every irradiated surface; yet they did not exhibit significant structure or plasma fluence dependence. Larger blisters or protrusions appeared after subsequent TDS heating up to 1000°C. The TDS results showed a single D desorption peak at ∼220°C for all samples and the D retention increased with increasing numbers of extrusion passes, i.e., the decrease of grain sizes. The increased D retention in this low temperature range should be attributed to the faster diffusion of D along the larger volume fraction of grain boundaries introduced by ECAP.

源语言英语
期刊论文编号595
页(从-至)595-600
页数6
期刊Plasma Science and Technology
卷17
期7
DOI
出版状态已出版 - 1 7月 2015

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