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Experimental and finite elemental investigations on residual stress of TSV

  • Fei Su*
  • , Tianbao Lan
  • , Yunhui Zhu
  • , Jing Chen
  • *此作品的通讯作者
  • Beihang University
  • Peking University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

In this paper, a Micro-Infrared Photo-elasticity (MIPE) system was set up and applied to evaluate the residual stress of Si chip around TSV. The MIPE system can only give overall stress information along thickness. To investigate the stress distribution around TSV quantitatively, finite element method was employed and the simulation results were compared with that of experimental measurements. Through this investigation, the maximum principal stress and affected area around TSV were determined.

源语言英语
主期刊名2014 15th International Conference on Electronic Packaging Technology, ICEPT 2014
编辑Keyun Bi, Zhong Tian, Ziqiang Xu
出版商Institute of Electrical and Electronics Engineers Inc.
1133-1137
页数5
ISBN(电子版)9781479947072
DOI
出版状态已出版 - 13 10月 2014
活动2014 15th International Conference on Electronic Packaging Technology, ICEPT 2014 - Chengdu, 中国
期限: 12 8月 201415 8月 2014

出版系列

姓名Proceedings of the Electronic Packaging Technology Conference, EPTC

会议

会议2014 15th International Conference on Electronic Packaging Technology, ICEPT 2014
国家/地区中国
Chengdu
时期12/08/1415/08/14

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