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Effects of nitrogen ion implantation and implantation energy on surface properties and adhesion strength of TiN films deposited on aluminum by magnetron sputtering

  • Youming Liu
  • , Liuhe Li
  • , Ming Xu
  • , Xun Cai
  • , Qiulong Chen
  • , Yawei Hu
  • , Paul K. Chu*
  • *此作品的通讯作者
  • Shanghai Jiao Tong University
  • City University of Hong Kong

科研成果: 期刊稿件文章同行评审

摘要

The performance of tribological coatings depends greatly on the adhesion strength between the coatings and substrates. In this work, we investigated the influence of the ion implantation energy of nitrogen on the adhesion and surface properties of TiN deposited on aluminum substrate. Aluminum samples were implanted with 15 keV, 30 keV and 40 keV nitrogen ions before TiN films were deposited using magnetron sputtering in a custom-designed multi-functional ion implanter. The adhesion properties of the implanted TiN films were assessed using nano-scratch tests and were observed to vary with the nitrogen ion implantation energy. Our frictional test results show that an appropriate ion implantation energy and dose can improve the frictional behavior of TiN films deposited on aluminum.

源语言英语
页(从-至)140-144
页数5
期刊Materials Science and Engineering: A
415
1-2
DOI
出版状态已出版 - 15 1月 2006

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