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Effects of incident angle on microstructure of Ni-Cr film deposited by PVD

  • Shan Yingchun*
  • , Xu Jiujun
  • , He Xiaodong
  • , Li Mingwei
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

A 2D kinetic Monte Carlo (KMC) simulation has been applied to study the microstructure of Ni-Cr film deposited by physical vapor deposition (PVD) for variable incident angle. In the KMC method, two phenomena were incorporated: adatom-surface collision and adatom diffusion, the interaction between atoms was described by embedded atom method and jumping energy was calculated by molecular statics calculations, initial location of adatom was located by Momentum Scheme. The results reveal that there exists critical incident angle, which is 35° for Ni-Cr thin film. When incident angle is less than 35°, incident angle have less affect on surface roughness factor and packing density, compact films with smooth surface are obtained, their surface roughness factor is bellow 1.12 and packing density is more than 99.6%. However, when incident angle is more than 35°, surface roughness factor increases quickly and packing density decreases sharply with incident angle increasing: surface roughness factor increase to 1.5 and 2.3 for incident angle of 45° and 60° respectively, packing density is below 99% and 96% accordingly. Which reveal that the self-shadowing effect emphasizes with incident angle increasing when the incident angle is more than 35°.

源语言英语
页(从-至)184-187
页数4
期刊Key Engineering Materials
373-374
出版状态已出版 - 2008
已对外发布

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