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Effects of dissolved oxygen on electrochemical and semiconductor properties of 316L stainless steel

  • Zhicao Feng
  • , Xuequn Cheng*
  • , Chaofang Dong
  • , Lin Xu
  • , Xiaogang Li
  • *此作品的通讯作者
  • University of Science and Technology Beijing

科研成果: 期刊稿件文章同行评审

摘要

The effects of dissolved oxygen on the electrochemical behavior and semiconductor properties of passive film formed on 316L SS in three solutions with different dissolved oxygen were studied by using polarization curve, Mott-Schottky analysis and the point defect model (PDM). The results show that higher dissolved oxygen accelerates both anodic and cathodic process. Based on Mott-Schottky analysis and PDM, the key parameters for passive film, donor density Nd, flat-band potential Efb and diffusivity of defects D0 were calculated. The results display that N d(1-7 × 1027m-3) and D0(1-18 × 10-16cm2/s) increase and Efb value reduces with the dissolved oxygen in solution.

源语言英语
页(从-至)171-177
页数7
期刊Journal of Nuclear Materials
407
3
DOI
出版状态已出版 - 31 12月 2010
已对外发布

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