TY - JOUR
T1 - Effects of atomic oxygen treatment on structures, morphologies and electrical properties of ZnO:Al films
AU - Wang, Wenwen
AU - Li, Chunzhi
AU - Zhang, Junying
AU - Diao, Xungang
PY - 2010/5/1
Y1 - 2010/5/1
N2 - ZnO:Al (ZAO) film has a potential application in providing spacecrafts the protection against atomic oxygen (AO) erosion. To advance the understanding of the AO resisting mechanisms and the relationships between the structures, morphologies and conductive properties of ZAO film, direct current magnetron sputtered ZAO films with different thicknesses were treated with AO in a ground-based simulation facility. The microstructure, surface chemical state, morphologies and electrical properties of pristine films and irradiated ones were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy and Hall measurement. It is found that AO exposure produces novel, oriented recrystallization of the surface particles. It also increases the content of oxygen ions in fully oxidized stoichiometric surroundings on the surface, resulting in the decrease of the conductivity. As the thickness of ZAO film increases, the crystallinity, conductivity and resistance to AO erosion are all improved.
AB - ZnO:Al (ZAO) film has a potential application in providing spacecrafts the protection against atomic oxygen (AO) erosion. To advance the understanding of the AO resisting mechanisms and the relationships between the structures, morphologies and conductive properties of ZAO film, direct current magnetron sputtered ZAO films with different thicknesses were treated with AO in a ground-based simulation facility. The microstructure, surface chemical state, morphologies and electrical properties of pristine films and irradiated ones were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy and Hall measurement. It is found that AO exposure produces novel, oriented recrystallization of the surface particles. It also increases the content of oxygen ions in fully oxidized stoichiometric surroundings on the surface, resulting in the decrease of the conductivity. As the thickness of ZAO film increases, the crystallinity, conductivity and resistance to AO erosion are all improved.
KW - Atomic oxygen
KW - Electrical properties
KW - Morphologies
KW - Surface structure
KW - ZnO:Al film
UR - https://www.scopus.com/pages/publications/77950595263
U2 - 10.1016/j.apsusc.2010.02.041
DO - 10.1016/j.apsusc.2010.02.041
M3 - 文章
AN - SCOPUS:77950595263
SN - 0169-4332
VL - 256
SP - 4527
EP - 4532
JO - Applied Surface Science
JF - Applied Surface Science
IS - 14
ER -