Effects of AlN layer thickness on magnetic anisotropy and transport phenomena of CoPt/AlN layered structure

The magnetic anisotropy was studied as a function of the AlN layer thickness in [AlN(x nm)/CoPt(2 nm)]5/AlN(x nm) layered structure (x is AlN layer thickness, and 5 is the number of multilayer series). The multilayered film was deposited by a sputtering apparatus equipped with two pairs of facing targets. It was found that, in the range of AlN layer thickness below 30 nm, CoPt/AlN multilayers transform from an enhanced in-plane magnetic anisotropy to perpendicular magnetic anisotropy (PMA) through thermal annealing in vacuum, with an optimized AlN thickness of 10 nm for strong PMA. However, beyond this thickness range, the PMA did not occur, and thermal annealing only results in magnetic isotropy in both parallel and perpendicular directions. The related structure analysis revealed that smooth interface and good texture of CoPt (111) make positive contributions to interface anisotropy energy and magnetocrystalline anisotropy energy for producing PMA in CoPt/AlN layered structure. In addition, the transport phenomena were also studied by using a four-probe method.