TY - GEN
T1 - Design of compliant parallel mechanism for Nanoimprint Lithography
AU - Sun, Xiantao
AU - Chen, Weihai
AU - Zhou, Rui
AU - Zhang, Jianbin
AU - Chen, Wenjie
PY - 2011
Y1 - 2011
N2 - Nanoimprint Lithography (NIL) is an emerging alternative lithography technology that can be repeated to print nanometer-scale geometries which have very good uniformity and repeatability. The compliant mechanism is a novel mechanism which has been utilized in many accurate mechanisms and precise instruments because of its obvious advantages such as easy assembly, zero friction, zero lubrication, low cost, monolithic manufacturing and reduced weight, etc. This paper mainly introduces the application of compliant mechanisms in NIL and analysis and design of several novel compliant mechanisms.
AB - Nanoimprint Lithography (NIL) is an emerging alternative lithography technology that can be repeated to print nanometer-scale geometries which have very good uniformity and repeatability. The compliant mechanism is a novel mechanism which has been utilized in many accurate mechanisms and precise instruments because of its obvious advantages such as easy assembly, zero friction, zero lubrication, low cost, monolithic manufacturing and reduced weight, etc. This paper mainly introduces the application of compliant mechanisms in NIL and analysis and design of several novel compliant mechanisms.
KW - compliant parallel mechanism
KW - flexure hinge
KW - Nanoimprint Lithography (NIL)
KW - non-linear analysis
UR - https://www.scopus.com/pages/publications/80052247351
U2 - 10.1109/ICIEA.2011.5975579
DO - 10.1109/ICIEA.2011.5975579
M3 - 会议稿件
AN - SCOPUS:80052247351
SN - 9781424487554
T3 - Proceedings of the 2011 6th IEEE Conference on Industrial Electronics and Applications, ICIEA 2011
SP - 200
EP - 205
BT - Proceedings of the 2011 6th IEEE Conference on Industrial Electronics and Applications, ICIEA 2011
T2 - 2011 6th IEEE Conference on Industrial Electronics and Applications, ICIEA 2011
Y2 - 21 June 2011 through 23 June 2011
ER -