Deposition of TiN by plasma activated EB-PVD: Activation by thermal electron emission from molten niobium

Hui Peng; Dapeng Zhou; Jiangfeng Zhang; Hongbo Guo; Shengkai Gong

doi:10.1016/j.surfcoat.2015.05.047

Deposition of TiN by plasma activated EB-PVD: Activation by thermal electron emission from molten niobium

Hui Peng^*
, Dapeng Zhou
, Jiangfeng Zhang
, Hongbo Guo
, Shengkai Gong

^*此作品的通讯作者

材料科学与工程学院

Beihang University
Guizhou Liyang Aviation Power Co. Ltd

科研成果: 期刊稿件 › 文章 › 同行评审

6 引用（Scopus）

摘要

This paper presents a new plasma activation process for electron beam evaporation. The plasma is generated by an interaction between the evaporated vapor (serving as anode) and the thermal electrons emitted from molten Nb (serving as cathode). Besides, an arc discharge burning in the anode vapor further enhances the plasma density. This process is demonstrated by means of the plasma activated deposition of TiN coating. Deposition rate of ~. 170. nm/min has been measured. Contamination caused by the slight evaporation of Nb to the coating is ~. 0.1. at.%.

源语言	英语
页（从-至）	645-648
页数	4
期刊	Surface and Coatings Technology
卷	276
DOI	https://doi.org/10.1016/j.surfcoat.2015.05.047
出版状态	已出版 - 25 8月 2015

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@article{4957c252737f431ab1dc5e9508c385d8,

title = "Deposition of TiN by plasma activated EB-PVD: Activation by thermal electron emission from molten niobium",

abstract = "This paper presents a new plasma activation process for electron beam evaporation. The plasma is generated by an interaction between the evaporated vapor (serving as anode) and the thermal electrons emitted from molten Nb (serving as cathode). Besides, an arc discharge burning in the anode vapor further enhances the plasma density. This process is demonstrated by means of the plasma activated deposition of TiN coating. Deposition rate of \textasciitilde{}. 170. nm/min has been measured. Contamination caused by the slight evaporation of Nb to the coating is \textasciitilde{}. 0.1. at.\%.",

keywords = "Electron beam evaporation, Niobium, Plasma activation, Refractory, Thermal electron emission",

author = "Hui Peng and Dapeng Zhou and Jiangfeng Zhang and Hongbo Guo and Shengkai Gong",

note = "Publisher Copyright: {\textcopyright} 2015 Elsevier B.V..",

year = "2015",

month = aug,

day = "25",

doi = "10.1016/j.surfcoat.2015.05.047",

language = "英语",

volume = "276",

pages = "645--648",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Deposition of TiN by plasma activated EB-PVD

T2 - Activation by thermal electron emission from molten niobium

AU - Peng, Hui

AU - Zhou, Dapeng

AU - Zhang, Jiangfeng

AU - Guo, Hongbo

AU - Gong, Shengkai

PY - 2015/8/25

Y1 - 2015/8/25

N2 - This paper presents a new plasma activation process for electron beam evaporation. The plasma is generated by an interaction between the evaporated vapor (serving as anode) and the thermal electrons emitted from molten Nb (serving as cathode). Besides, an arc discharge burning in the anode vapor further enhances the plasma density. This process is demonstrated by means of the plasma activated deposition of TiN coating. Deposition rate of ~. 170. nm/min has been measured. Contamination caused by the slight evaporation of Nb to the coating is ~. 0.1. at.%.

AB - This paper presents a new plasma activation process for electron beam evaporation. The plasma is generated by an interaction between the evaporated vapor (serving as anode) and the thermal electrons emitted from molten Nb (serving as cathode). Besides, an arc discharge burning in the anode vapor further enhances the plasma density. This process is demonstrated by means of the plasma activated deposition of TiN coating. Deposition rate of ~. 170. nm/min has been measured. Contamination caused by the slight evaporation of Nb to the coating is ~. 0.1. at.%.

KW - Electron beam evaporation

KW - Niobium

KW - Plasma activation

KW - Refractory

KW - Thermal electron emission

UR - https://www.scopus.com/pages/publications/84939261511

U2 - 10.1016/j.surfcoat.2015.05.047

DO - 10.1016/j.surfcoat.2015.05.047

M3 - 文章

AN - SCOPUS:84939261511

SN - 0257-8972

VL - 276

SP - 645

EP - 648

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Deposition of TiN by plasma activated EB-PVD: Activation by thermal electron emission from molten niobium

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