Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide

Sujuan Wu; Pascal Brault; Cong Wang

Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide

Sujuan Wu
, Pascal Brault^*
, Cong Wang

^*此作品的通讯作者

集成电路科学与工程学院

Beihang University
Université d'Orléans

科研成果: 期刊稿件 › 文章 › 同行评审

9 引用（Scopus）

摘要

Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 μg.cm^-2 to 5 μg.cm^-2 as the pore diameter increased from 40 nm to 320 nm. The pore diameter is decreasing as Pt is deposited. Sputtered Pt is observed to grow as clusters on the surface and along the pore walls.

源语言	英语
页（从-至）	451-455
页数	5
期刊	Journal of Optoelectronics and Advanced Materials
卷	12
期	3
出版状态	已出版 - 3月 2010

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title = "Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide",

abstract = "Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 μg.cm-2 to 5 μg.cm-2 as the pore diameter increased from 40 nm to 320 nm. The pore diameter is decreasing as Pt is deposited. Sputtered Pt is observed to grow as clusters on the surface and along the pore walls.",

keywords = "Anodic aluminum oxide, Anomalous diffusion, Platinum, RBS, Sputtering deposition",

author = "Sujuan Wu and Pascal Brault and Cong Wang",

year = "2010",

month = mar,

language = "英语",

volume = "12",

pages = "451--455",

journal = "Journal of Optoelectronics and Advanced Materials",

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publisher = "National Institute of Optoelectronics",

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TY - JOUR

T1 - Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide

AU - Wu, Sujuan

AU - Brault, Pascal

AU - Wang, Cong

PY - 2010/3

Y1 - 2010/3

N2 - Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 μg.cm-2 to 5 μg.cm-2 as the pore diameter increased from 40 nm to 320 nm. The pore diameter is decreasing as Pt is deposited. Sputtered Pt is observed to grow as clusters on the surface and along the pore walls.

AB - Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 μg.cm-2 to 5 μg.cm-2 as the pore diameter increased from 40 nm to 320 nm. The pore diameter is decreasing as Pt is deposited. Sputtered Pt is observed to grow as clusters on the surface and along the pore walls.

KW - Anodic aluminum oxide

KW - Anomalous diffusion

KW - Platinum

KW - RBS

KW - Sputtering deposition

UR - https://www.scopus.com/pages/publications/77950656879

M3 - 文章

AN - SCOPUS:77950656879

SN - 1454-4164

VL - 12

SP - 451

EP - 455

JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

IS - 3

ER -

Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide

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