摘要
The crystallization kinetics of an amorphous Ti-rich NiTi film prepared by DC magnetron sputtering was determined by non-isothermal techniques. The activation energy values of crystallization and the mean value of the Avrami parameter are 382 kJ/mol and 0.85, respectively. The calculated isothermal kinetic curve of amorphous film at 773 K coincides with the result of X-ray diffraction. The formation of a Ti2Ni phase is accompanied with the crystallization of Ti-rich NiTi film.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1131-1135 |
| 页数 | 5 |
| 期刊 | Acta Metallurgica Sinica (English Letters) |
| 卷 | 13 |
| 期 | 6 |
| 出版状态 | 已出版 - 12月 2000 |
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