摘要
Undoped GaN epilayer on c-face (0 0 0 1) sapphire substrate has been grown by metalorganic vapor-phase epitaxy (MOVPE) in a horizontal-type low-pressure two-channel reactor. Photoluminescence (PL) as a function of temperature and excitation intensity have been systematically studied, and the competition between near band gap ultraviolet (UV) and defect-related yellow luminescence (YL) has been extensively investigated. It is revealed that the ratio of the UV-to-YL peak intensities depends strongly on the excitation intensity and the measurement temperature. The obtained results have been analyzed in comparison with the theoretical predications based on a bimolecular model.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 96-103 |
| 页数 | 8 |
| 期刊 | Journal of Crystal Growth |
| 卷 | 222 |
| 期 | 1-2 |
| DOI | |
| 出版状态 | 已出版 - 1月 2001 |
| 已对外发布 | 是 |
指纹
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