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Chemical trends of Schottky barrier behavior on monolayer hexagonal B, Al, and Ga nitrides

  • Haichang Lu
  • , Yuzheng Guo
  • , John Robertson*
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

The Schottky Barrier Heights (SBH) of metal layers on top of monolayer hexagonal X-nitrides (X = B, Al, Ga, and h-XN) are calculated using supercells and density functional theory so as to understand the chemical trends of contact formation on graphene and the 2D layered semiconductors such as the transition metal dichalcogenides. The Fermi level pinning factor S of SBHs on h-BN is calculated to be nearly 1, indicating no pinning. For h-AlN and h-GaN, the calculated pinning factor is about 0.63, less than for h-BN. We attribute this to the formation of stronger, chemisorptive bonds between the nitrides and the contact metal layer. Generally, the h-BN layer remains in a planar sp2 geometry and has weak physisorptive bonds to the metals, whereas h-AlN and h-GaN buckle out of their planar geometry which enables them to form the chemisorptive bonds to the metals.

源语言英语
文章编号065302
期刊Journal of Applied Physics
120
6
DOI
出版状态已出版 - 14 8月 2016
已对外发布

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